| Marka Adı: | ZMSH |
| Model Numarası: | SIC substratı 10 × 10mm |
| Adedi: | 25 |
| fiyat: | by case |
| Teslim Zamanı: | 2-4 hafta |
| Ödeme Şartları: | T/T |
High-Performance Semiconductor Solution for Advanced Electronics
The 10×10mm 4H-N type silicon carbide (SiC) substrateis a high-performance semiconductor material based on third-generation SiC technology. Manufactured via Physical Vapor Transport (PVT)or High-Temperature Chemical Vapor Deposition (HTCVD), it offers exceptional thermal, electrical, and mechanical properties. With a dimensional tolerance of ±0.05 mmand surface roughness Ra < 0.5 nm, it is ideal for prototyping power devices, RF components, and optoelectronic systems. The substrate is available in 4H-SiCor 6H-SiCpolytypes, with N-type or P-type doping options, and undergoes rigorous quality inspections (e.g., XRD, optical microscopy) to ensure semiconductor-grade reliability.
Table 1: Key Parameters of 10×10mm 4H-N Type SiC Substrate
Parameter Category | Specifications |
|---|---|
Material Type | 4H-SiC, N-type doped |
Dimensions | 10×10 mm (±0.05 mm tolerance) |
Thickness Options | 100–500 μm |
Surface Roughness | Ra < 0.5 nm (polished, epitaxial-ready) |
Electrical Properties | Resistivity: 0.01–0.1 Ω·cm; Carrier Concentration: 1×10¹⁸–5×10¹⁹ cm⁻³ |
Crystal Orientation | (0001) ±0.5° (standard) |
Thermal Conductivity | 490 W/m·K (typical) |
Defect Density | Micropipe Density: <1 cm⁻²; Dislocation Density: <10⁴ cm⁻² |
Customization | Non-standard shapes, doping profiles, backside metallization |
Superior Thermal Management: With a thermal conductivity of 490 W/m·K(3× higher than silicon), the substrate enables efficient heat dissipation, reducing device operating temperatures and enhancing system longevity.
High Voltage Tolerance: A breakdown field strength of 2–4 MV/cm(10× higher than silicon) supports high-power applications, while a high electron saturation drift velocity (2×10⁷ cm/s) benefits high-frequency designs.
Mechanical Robustness: Vickers hardness of 28–32 GPaand flexural strength >400 MPaprovide 5–10× longer service life than conventional materials.
Environmental Stability: Operational temperatures up to 600°Cand a low thermal expansion coefficient (4.0×10⁻⁶/K) ensure performance in extreme conditions.
Table 2: Core Application Areas of 10×10mm SiC Substrates
Application Field | Use Cases | Benefits |
|---|---|---|
Electric Vehicles | Powertrain inverters, SiC MOSFETs/ diodes | 3–5% higher inverter efficiency, extended EV range |
5G Infrastructure | RF power amplifiers (mmWave bands: 24–39 GHz) | >20% reduction in base station power consumption |
Smart Grids | HVDC systems, solid-state transformers | Improved power transmission efficiency |
Industrial Automation | High-power motor drives (switching frequency >100 kHz) | 50% smaller device size |
Aerospace & Defense | Satellite power systems, engine controls | Reliability in extreme temperatures/radiation |
Optoelectronics | UV LEDs, laser diodes | Optimal substrate due to wide bandgap and thermal stability |
Geometry: Round, rectangular, or user-defined shapes.
Doping: N-type or P-type with concentrations from 10¹⁵ to 10¹⁹ cm⁻³.
Thickness: 100–500 μm, with optional backside metallization for improved integration.
The 10×10mm 4H-N type SiC substrate combines advanced material properties with flexibility in design, making it a critical enabler for next-generation electronics in automotive, communication, and energy systems. Its compatibility with high-temperature, high-frequency, and high-power applications positions it as a cornerstone of semiconductor innovation.